Time Domain ThermoreflectanceTime-Domain Thermoreflectance
We use ultra-short laser pulses to characterize thermal transport across a broad range of materials and interfaces.  The fast laser heating and temperature probing enables high temporal and spatial resolution, which is often necessary to gain knowledge of thermal properties and events in nanostructures.






The photoacoustic technique is a method to extract thermal properties from thin film and bulk samples.  The technique involves periodic laser heating and indirect probing of sample temperature through sensing the pressure change generated in an enclosed volume of gas above the sample surface.







IMG_4707Electrical Probe Station

We use two and four point probe measurements with an LCR meter and source meter to characterize the electrical properties of nanostructured electronic devices.






IMG_4721 Solar Conversion Efficiency Measurements

Broadband Xenon arc lamp combined with a chopper, monochromator, and lock-in amplifier allow for spectral responsivity and total optical-to-electrical conversion efficiency measurements over the range of 400 to 2000 nm. Can be combined with the probe station to conduct IV scans under illumination.





IMG_4725Optical Cryostat

We use a liquid Helium cryostat to perform thermoreflectance measurements over a wide temperature range, 8 to 500 K, to develop a better understand of the fundamental phonon scattering processes within materials and across interfaces.









Steady-State Meter Bars

We employ a modified version of the ASTM D-5470 standard for measuring thermal conductivity and thermal contact resistance.  The modification enables improve measurement reproducibility and accuracy when combined with high precision thermocouples.  The technique is used to characterize the performance of advanced thermal interface materials.




Transient Plane Source

We use the commercial system Hot Disk TPS 2500 S, which meets an ISO standard (ISO/DIS 22007-2.2), to measure thermal conductivity of solids, liquids, and composites from approximately -75 to 200 °C.




Electrochemical Analysis and Deposition

Electrochemical analysis is used to characterize electrode kinetics, ion diffusion rates, and other parameters that are important to electrochemical energy systems.  We use electrochemical deposition to grow nanostructures of conducting polymer and metals.




Chemical Vapor Deposition

We use thermal or plasma assisted chemical vapor deposition to grow vertical carbon nanotube arrays on a variety of technically important substrates (e.g., silicon, oxides and metals).






Georgia Tech Institute for Electronics and Nanotechnology 

We use the cleanroom and lab facilities available in the Georgia Tech IEN for a broad range of materials synthesis and characterization activities.